X-ray source and fluorescent X-ray analyzing apparatus
US7809113B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2007 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Oct 5, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/088
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to an X-ray source for emitting a characteristic X-ray and a fluorescent X-ray analyzing apparatus using the X-ray source. A secondary target is arranged in superposition on a primary target. An electron beam generated by an electron gun enters the primary target, which passes and emits a continuous X-ray. The secondary target transmits and emits a characteristic X-ray excited by the continuous X-ray emitted from the primary target. The primary target and the secondary target are superposed one on the other, so that the continuous X-ray emitted from the primary target efficiently excites the secondary target thereby to efficiently generate the characteristic X-ray.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.