Flux and process for hot dip galvanization
US7811389B2 · kind B2 · utility
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11References
65Claims
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Key dates
| Filing date | Dec 18, 2006 |
| Grant date | Oct 12, 2010 |
| Priority date | — |
| Expiry date | Jul 23, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C2/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A flux for use in a hot dip galvanization process has an acidic component so that the flux has a pH of about 1.5 or less. The flux also includes an alkali metal chloride and a nonionic surfactant containing polyoxyethylenated straight-chain alcohols with a hydrophile-lipophile balance (HLB) of less than 11. Depending on the particular application, the flux also includes other components, such as ferric chloride, an inhibitor containing an amino derivative and bismuth oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.