Controlled sulfur species deposition process
US7811634B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2004 |
| Grant date | Oct 12, 2010 |
| Priority date | — |
| Expiry date | Jun 5, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B33/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is a method for the deposition of a thin film of a pre-determined composition onto a substrate, the thin film comprising ternary, quaternary or higher sulfide compounds selected from the group consisting of thioaluminates, thiogallates and thioindates of at least one element from Groups IIA and IIB of the Periodic Table. The method comprises volatizing at least one source material of a sulfide of a pre-determined composition to form a sulfur-bearing thin film composition on a substrate and simultaneously inhibiting any excess quantity of sulfur-bearing species volatilized from the at least one source material from impinging on the substrate. The method improves the luminance and emission spectrum of phosphor materials used for full color ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.