Patterning of solid state features by direct write nanolithographic printing
US7811635B2 · kind B2 · utility
1Cited by
4References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2007 |
| Grant date | Oct 12, 2010 |
| Priority date | — |
| Expiry date | Aug 29, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention includes a method of fabricating organic/inorganic composite nanostructures on a substrate comprising depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography. The nanostructures comprises arrays of lines and/or dots having widths/diameters less than 1 micron. The present invention also includes a device comprising an organic/inorganic composite nanoscale region chemically bonded to a substrate, wherein the nanoscale region, wherein the nanoscale region has a nanometer scale dimension other than height.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.