Patent · US Active

Method for fabricating electronic and photonic devices on a semiconductor substrate

US7811844B2 · kind B2 · utility

28Cited by
49References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 29, 2008
Grant dateOct 12, 2010
Priority date
Expiry dateAug 29, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/40

Abstract

A method for fabricating photonic and electronic devices on a substrate is disclosed. Multiple slabs are initially patterned and etched on a layer of a substrate. An electronic device is fabricated on a first one of the slabs and a photonic device is fabricated on a second one of the slabs, such that the electronic device and the photonic device are formed on the same layer of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.