Low vapor pressure high purity gas delivery system
US7813627B2 · kind B2 · utility
2Cited by
12References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2006 |
| Grant date | Oct 12, 2010 |
| Priority date | — |
| Expiry date | May 23, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0396
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Systems, apparatuses and methods for vapor phase fluid delivery to a desired end use are provided, wherein the conditions of the system are monitored to determine when the water concentration or supply vessel surface temperature exceeds a specified value or when the low vapor pressure fluid pressure falls below a specified value for the purpose of removing a first supply vessel from service by discontinuing vapor flow from the first supply vessel and initiating vapor flow from a second supply vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.