Process for depositing a thin layer and product obtained thereby
US7815977B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2007 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | May 29, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages. In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.