Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative
US7816067B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 24, 2006 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Jul 16, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative.A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1):wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1 substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.