Liquid crystal display device and method for manufacturing the same
US7816158B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2006 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Jul 22, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13606
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a liquid crystal display device to be operated at high speed and with high precision by improving performance of a thin-film transistor without increasing cross capacity of gate lines and data lines. On an upper layer of a gate insulator GI at an intersection of gate lines GL and data lines DL to be prepared on an active matrix substrate SUB1, which makes up a liquid crystal display panel of a liquid crystal display device, an insulating material with low dielectric constant is dropped by ink jet coating method to prepare another insulator LDP in order to improve performance characteristics of the thin-film transistor to be prepared on a silicon semiconductor layer SI without increasing cross capacity on said intersection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.