Laser patterning apparatus
US7816649B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2008 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Apr 25, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
Abstract
A laser patterning apparatus for handling a donor film and improving compression uniformity between the donor film and an acceptor substrate is provided. The laser patterning apparatus includes: a stage that supports an acceptor substrate; a shielding mask that is placed on the acceptor substrate to form a pattern and is attached to a donor film on one surface thereof; a laser gun that is disposed at an upper part of the stage to radiate laser light to a portion of the donor film through the pattern of the shielding mask; a pressing member that corresponds to a portion of the shielding mask; and an actuator that is connected to one side of the pressing member to press the pressing member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.