High efficiency and high bandwidth plasma generator system for flow control and noise reduction
US7817396B2 · kind B2 · utility
10Cited by
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15Claims
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Key dates
| Filing date | Oct 25, 2007 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Jan 6, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generation system includes a pulse generator having at least one switch and that is configured to convert a DC voltage to a desired high frequency, high breakdown voltage pulse sufficient to break down a high-breakdown voltage gap, wherein all pulse generator switches are solely low to medium voltage, high frequency switches, and further configured to apply the breakdown voltage to a plasma load for the generation of plasma. In one application, the plasma generation system is useful to manipulate the flow of jets and provide highly efficient acoustic noise reduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.