Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch
US7819979B1 · kind B1 · utility
153Cited by
3References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2005 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | Oct 19, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/84
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.