Antigen exposure chamber and method of cleaning and drying the same
US7819987B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2005 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | Dec 4, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B9/093
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles for jetting the cleaning water supplied from the cleaning water supply device into the antigen exposure chamber and ducts of fan units to clean the antigen exposure chamber and the ducts; a floor surface of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.