Patent · US Expired

Dielectric-layer-coated substrate and installation for production thereof

US7820017B2 · kind B2 · utility

1Cited by

25References

12Claims

0Family size

Assignee

SAINT-GOBAIN GLASS FRANCE · FR

Inventors

Carole Baubet · Aachen, DE
Klaus Fischer · Speyer, DE
Marcus Loergen · Herzogenrath, DE
Jean-Christophe Giron · Aachen, DE
Nicolas Nadaud · Paris, FR
Eric Mattman · Paris, FR
Jean-Paul Rousseau · Nogent-sur-Marne, FR
Alfred Hofrichter · Paris, FR
Manfred Jansen · Geilenkirchen, DE

Key dates

Filing date	Jun 28, 2004
Grant date	Oct 26, 2010
Priority date	—
Expiry date	Jan 22, 2025

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2211/446
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.