Multiple mask and method for producing differently doped regions
US7820342B2 · kind B2 · utility
1Cited by
8References
9Claims
0Family size
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Key dates
| Filing date | Nov 3, 2005 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | Nov 3, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/266
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In order to produce doping regions (DG) in a substrate (S) having different dopings with the aid of a single mask (DM) different mask regions are provided which have elongated mask openings (MO) having different orientations relative to the spatial direction of an oblique implantation. The substrate is rotated between the first and second oblique implantations, wherein during the first oblique implantation maximum and minimum shadings in the different mask regions are opposite one another and the conditions are precisely reversed during the second oblique implantation after the rotation of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.