Patent · US Active

Photolatent systems

US7820865B2 · kind B2 · utility

2Cited by

3References

15Claims

0Family size

Assignee

Ciba Corp. · US

Inventors

Katharina Fritzsche · Weil am Rhein, DE
Walter Fischer · Reinach, CH
Johannes Benkhoff · Basel, CH
Karin Powell · Bad Kötzting, DE
Dirk Simon · Mutterstadt, DE

Key dates

Filing date	Oct 30, 2006
Grant date	Oct 26, 2010
Priority date	—
Expiry date	Jan 20, 2027

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08K5/134
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

The instant invention relates to new photolatent compounds of the formula I wherein R1 and R2 are each independently of the other C1-C10alkyl or C3-C8cycloalkyl, R3 is hydrogen or C1-C4alkyl, and wherein the photochemically cleaved group R4OH is selected from the group consisting of fragrances, UV absorbers, anti-microbials, anti-fogging agents and clarifiers; with the proviso that, when R1 and R2 are tert-butyl and R3 is hydrogen, R4 is not methyl or phenyl.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.