Liquid applicator and method for reducing the concentration of by-products from antiseptic
US7824122B2 · kind B2 · utility
44Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2007 |
| Grant date | Nov 2, 2010 |
| Priority date | — |
| Expiry date | Jun 13, 2029 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA45D2200/1018
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Applicators and a method for reducing the concentration of unwanted chemicals, such as para-chloroaniline (PCA) from an antiseptic solution. More specifically, the applicator includes antiseptic solution in amount sufficient to be applied to a desired surface and to have an antimicrobial effect on the desired surface and a porous element. The porous element selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the at least one porous element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.