Patent · US Active

Electrochemical device

US7824537B2 · kind B2 · utility

1Cited by
1References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 2, 2005
Grant dateNov 2, 2010
Priority date
Expiry dateMar 1, 2028

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC02F2001/46142
  • WIPO fieldEnvironmental technology
  • WIPO sectorChemistry

Abstract

An electrochemical device including: (a) a semiconductor layer, wherein the semiconductor is silicon or silicon carbide, and where the layer has a thickness from 1 to 1000 μm; (b) a TiO2 layer on the semiconductor layer, where the layer may include an alkaline earth oxide MO up to an amount where the layer is MtiO3, and where the layer has a thickness from 5 nm to 1 mm; (c) a grid of inert metal on the TiO2 layer, arranged so as to be able to apply a electric field across the TiO2 layer; and (d) an ohmic contact on the semiconductor layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.