Photoacid generator compounds and compositions
US7824839B2 · kind B2 · utility
23Cited by
20References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2008 |
| Grant date | Nov 2, 2010 |
| Priority date | — |
| Expiry date | Feb 28, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/114
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.