Patent · US Active

Elimination of stitch artifacts in a planar illumination area

US7826698B1 · kind B1 · utility

61Cited by

128References

19Claims

0Family size

Assignee

OREE, INC. · IL

Inventors

Noam Meir · Herzliya, IL
Micha Zimmermann · Haifa, IL
Yosi Shani · Raanana, IL

Key dates

Filing date	Apr 30, 2010
Grant date	Nov 2, 2010
Priority date	—
Expiry date	Apr 30, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG02B6/0088
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.