Method and system for providing a microelectronic device using a plurality of focus distances
US7829264B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 9, 2007 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Apr 7, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3116
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and system for providing a microelectric device are described. The method and system include providing a photoresist layer having a surface. The method and system also include setting a focus range and exposing the photoresist layer over the focus range to form a photoresist mask having a trench therein. The focus range corresponding to a plurality of focus distances. The focus range also corresponds to a nonzero angle to be formed in the photoresist layer and to the structure. The trench has at least one sidewall that forms the angle with a normal to the surface. The method and system also include providing the structure utilizing the trench.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.