Diamond medical devices

US7829377B2 · kind B2 · utility

Assignee

• Apollo Diamond, Inc · US

Inventors

• Robert C. Linares · Green Brook, US
• Patrick J. Doering · Holliston, US
• Bryant Linares · Sherborn, US
• Alfred Genis · Douglas, US
• William W. Dromeshauser · Norwell, US
• Michael W. Murray · Stuart, US
• Alicia E. Novak · Denver, US
• John M. Abrahams · Scarsdale, US

Key dates

• Filing date: Jan 11, 2006
• Grant date: Nov 9, 2010
• Expiry date: Jun 8, 2028

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C1/00634
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

Masked and controlled ion implants, coupled with annealing or etching are used in CVD formed single crystal diamond to create structures for both optical applications, nanoelectromechanical device formation, and medical device formation. Ion implantation is employed to deliver one or more atomic species into and beneath the diamond growth surface in order to form an implanted layer with a peak concentration of atoms at a predetermined depth beneath the diamond growth surface. The composition is heated in a non-oxidizing environment under suitable conditions to cause separation of the diamond proximate the implanted layer. Further ion implants may be used in released structures to straighten or curve them as desired. Boron doping may also be utilized to create conductive diamond structures.