Low CTE photomachinable glass
US7829489B2 · kind B2 · utility
9Cited by
11References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2007 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Mar 23, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/34
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention describes a composition, method and article for a photomachinable glass having a coefficient of thermal expansion from less than 6×10−6/° C. in the temperature range of 0° C. to 300° C. The photomachinable glass composition is a low expansion glass having an amorphous glass phase and crystalline phases selected from the group consisting of spudomene and lithium disilicate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.