Antireflective hardmask composition and methods for using same
US7829638B2 · kind B2 · utility
3Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2006 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Oct 4, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.