Optical interrogation system and microplate position correction method
US7830513B2 · kind B2 · utility
2Cited by
4References
33Claims
0Family size
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Key dates
| Filing date | Sep 11, 2007 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Mar 15, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N35/028
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the LID microplate can be properly interrogated after being removed from and then re-inserted back into a microplate holder/XY translation stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.