Patent · US Active

Imprint lithography apparatus and methods

US7832416B2 · kind B2 · utility

6Cited by
7References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 10, 2006
Grant dateNov 16, 2010
Priority date—
Expiry dateJun 29, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29C2043/025
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An imprint lithography apparatus including a service station.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.