Patent · US Active

Processes and apparatuses for producing porous materials

US7833428B2 · kind B2 · utility

0Cited by
0References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 18, 2007
Grant dateNov 16, 2010
Priority date
Expiry dateMay 24, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/32
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Processes and apparatuses for producing a porous material, such as nano-porous silicon (npSi) media suitable for storage and retrieval of elemental hydrogen. Processes of this invention generally entail applying a magnetic field to a substrate that contains charge carriers and is in contact with an etchant, and then etching the substrate with the etchant while relative movement occurs between the substrate and the magnetic field. During etching, the charge carriers move relative to the substrate and the magnetic field, and porosity forms at surfaces of the substrate contacting the etchant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.