Photoacid generators and lithographic resists comprising the same
US7833690B2 · kind B2 · utility
9Cited by
2References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2006 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Oct 23, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.