Patent · US Active

Methods for fabricating nanoscale electrodes and uses thereof

US7833904B2 · kind B2 · utility

7Cited by

20References

27Claims

0Family size

Assignee

The Trustees of Columbia University in the City of New York · US

Inventors

Jinyao Tang · Hong Kong, CN
Samuel Jonas Wind · White Plains, US

Key dates

Filing date	Jun 16, 2006
Grant date	Nov 16, 2010
Priority date	—
Expiry date	Jul 22, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49117
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The present invention relates to methods for fabricating nanoscale electrodes separated by a nanogap, wherein the gap size may be controlled with high precision using a self-aligning aluminum oxide mask, such that the gap width depends upon the thickness of the aluminum oxide mask. The invention also provides methods for using the nanoscale electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.