Removing solution
US7833957B2 · kind B2 · utility
7Cited by
12References
41Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2003 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | May 18, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/26
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a resist-removing solution for low-k film and a cleaning solution for via holes or capacitors, the solutions comprising hydrogen fluoride (HF) and at least one member selected from the group consisting of organic acids and organic solvents. The invention also provides a method of removing resist and a method of cleaning via holes or capacitors by the use of the solutions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.