Evaluation method for evaluating optical characteristics of optical system, evaluation method for evaluating projector, evaluation device for evaluating optical characteristics, and screen
US7834990B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2007 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Oct 13, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0271
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An evaluation method for evaluating optical characteristics of an optical system, the evaluation method includes: providing an optical system that is an evaluation object and that has a light incidence section and a light emission section; disposing a first pattern having a fist predetermined pitch, in an optical path of light which is incident onto the light incidence section; disposing a projection surface having a second pattern with a second predetermined pitch, at the position to which the light emitted from the light emission section is reached; projecting an image of the first pattern onto the projection surface through the optical system; and evaluating the optical characteristics of the optical system by observing a state of moiré fringes which are generated onto the projection surface due to interference between the image and the second pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.