System and method for removal of hydrogen peroxide from a contaminated media
US7837952B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Mar 10, 2008 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Mar 10, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2305/10
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
Disclosed herein are systems and methods for removing hydrogen peroxide from a liquid media. This is accomplished by adding an oxidizable metal to the photoreactive slurry. The oxidizable metal is then oxidized, which then causes the oxidized metal particles to bond to the particles of photoreactive slurry to create oxidized metal catalyst particles. Once bonded to the slurry particles, the metal remains in the decontamination system and its presence destabilizes and catalyzes the decomposition of the hydrogen peroxide in the contaminated media. Once destabilized, the hydrogen peroxide breaks down into water and oxygen particles, which are not detrimental to the operation of the system. The oxygen molecules may be vented from the system, while the water molecules simply mix with the liquid media flowing through the system. The photoreactive slurry and the oxidized metal are recovered and recycled so as not to have to be continuously replenished.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.