Method and device for fabricating nano-structure with patterned particle beam
US7838851B2 · kind B2 · utility
1Cited by
8References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2007 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Jul 28, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/901
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.