Measurement apparatus
US7841102B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 8, 2008 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Apr 10, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B3/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measurement apparatus for measuring a distance between a base surface and an upper surface of a stepped structure of a workpiece. The measurement apparatus includes a supporting member having an upper surface for supporting the workpiece, a holding member fixed on the top surface, and a micrometer. The holding member includes a reference platform and a depression formed on the reference platform and facing the upper surface. The micrometer is fixed to the holding member and includes an extendable measuring shaft with a contacting portion extending out of the reference platform. The distance is measured by pushing the workpiece into the depression until the base surface make contact with the reference platform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.