Purifying organic materials for physical vapor deposition
US7842341B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 10, 2005 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Jan 10, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for evaporating a plurality of purified organic materials in a thermal physical vapor deposition system, comprising the steps of: mixing predetermined amounts of first and second organic materials to form a mixture of materials at a predetermined ratio; processing at least one of the organic materials at less than the sublimation temperature of the at least one of the organic materials before or after mixing to remove a first contaminant, wherein if processing is after mixing, the processing temperature is lower than the sublimation temperature of each of the organic materials; providing a thermal physical vapor deposition source; transferring the purified mixture of organic materials into the thermal physical vapor deposition source while maintaining the purified mixture of organic materials in a controlled, contaminant-free environment; and using the source to evaporate the purified mixture of organic materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.