Patent · US Active

Method for low-temperature sealing of a cavity under vacuum or under controlled atmosphere

US7842556B2 · kind B2 · utility

0Cited by
2References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 11, 2008
Grant dateNov 30, 2010
Priority date—
Expiry dateJan 1, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/0145
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

This method for sealing a cavity of a component placed in the chamber is carried out by physical vapour deposition (PVD) of germanium or silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.