Method to form a photovoltaic cell comprising a thin lamina

US7842585B2 · kind B2 · utility

Assignee

• Twin Creeks Technologies, Inc. · US

Inventors

• Srinivasan Sivaram · Monte Sereno, US
• Aditya Agarwal · Sunnyvale, US
• S. Brad Herner · San Jose, US
• Christopher J. Petti · Mountain View, US

Key dates

• Filing date: Sep 11, 2008
• Grant date: Nov 30, 2010
• Expiry date: Sep 11, 2028

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50

Abstract

A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.