Patent · US Active

Micromirror system

US7843620B2 · kind B2 · utility

2Cited by

2References

23Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventor

Stefan Pinter · Reutlingen, DE

Key dates

Filing date	Dec 7, 2007
Grant date	Nov 30, 2010
Priority date	—
Expiry date	Jan 13, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0841
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A micromirror system having at least two micromirrors, each suspended on a substrate wafer via at least one torsion spring. The axes of rotation of the micromirrors are disposed essentially perpendicular to each other in order to permit deflection of an optical beam in two directions essentially perpendicular to each other. The micromirrors and the torsion springs are patterned out of the substrate wafer and lie essentially in one plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.