Method for supplying a plating composition with deposition metal ion during a plating operation

US7846316B2 · kind B2 · utility

Assignee

• Enthone GmbH · US

Inventors

• Axel Koenig · Wolfsburg, DE
• Andreas Möbius · Kaarst, DE
• Franz-Josef Stark · Lenggries, DE

Key dates

• Filing date: May 25, 2006
• Grant date: Dec 7, 2010
• Expiry date: Sep 10, 2029

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25D21/22
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Method and plating bath apparatus for setting the ionic strength of a plating composition using Donnan dialysis by flowing the plating composition along a first surface of a membrane while simultaneously flowing a deposition metal ion exchange composition along a second surface of the membrane such that the deposition metal ion crosses the membrane from the deposition metal ion exchange composition to the plating composition while an exchange cation different from the deposition metal ion crosses the membrane from the plating composition to the deposition metal ion exchange composition.