Method of positioning patterns from block copolymer self-assembly
US7846502B2 · kind B2 · utility
11Cited by
4References
12Claims
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Key dates
| Filing date | Jun 11, 2009 |
| Grant date | Dec 7, 2010 |
| Priority date | — |
| Expiry date | Aug 12, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.