Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask
US7846643B1 · kind B1 · utility
148Cited by
12References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2007 |
| Grant date | Dec 7, 2010 |
| Priority date | — |
| Expiry date | Feb 19, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for providing a microelectric device, such as a magnetoresistive read sensor are described. The method and system include providing a mask layer on the microelectric device. The method and system further include exposing the mask layer to provide a mask. A portion of the mask covers a portion of the microelectric device. The step of exposing the mask layer further includes utilizing a chromeless alt-phase shift mask for providing the portion of the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.