Patent · US Active

Plasma reactor with high productivity

US7850819B2 · kind B2 · utility

0Cited by

4References

5Claims

0Family size

Assignee

Centrotherm Photovoltaics AG · DE

Inventors

Harald Wanka · Reutlingen, DE
Johann Georg Reichart · Blaubeuren, DE
Hans-Peter Voelk · Griesingen, DE

Key dates

Filing date	Apr 18, 2005
Grant date	Dec 14, 2010
Priority date	—
Expiry date	Feb 2, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S156/916
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a plasma reactor with high productivity for surface coating or modification of objects and/or substrates by plasma processes in a processing chamber, preferably as vacuum processes at reduced pressure, having an entrance lock to the processing chamber and an exit lock. The invention is to create a plasma reactor of high productivity, which, with uniformly high productivity, will make possible a rapid simple and selective cleaning of the plasma sources and adjacent parts of the processing chamber. According to the invention, two plasma sources (1, 2) are provided, each alternately couplable to a reaction chamber (7) or a re-etching chamber (8). The plasma sources (1, 2) are fixed for this purpose to an alternating means (6) in such manner that the plasma sources (1, 2) are positionable by a rotatory motion of the alternating means (6) in the reaction chamber (7) or the re-etching chamber (8).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.