Silicon particles, silicon particle superlattice and method for producing the same
US7850938B2 · kind B2 · utility
2Cited by
4References
1Claims
0Family size
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Key dates
| Filing date | Feb 18, 2005 |
| Grant date | Dec 14, 2010 |
| Priority date | — |
| Expiry date | Mar 21, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2982
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A production method, comprising a step of synthesizing silicon particle-containing silicon oxide particles by performing a gas phase reaction of monosilane gas and oxidizing gas for oxidizing the monosilane gas and a step of removing the silicon oxide with hydrofluoric acid after holding the silicon oxide particle powder in an inert atmosphere at 800-1400°, provides high-purity silicon nanoparticles which are highly practical as material powder for high-performance light-emitting elements and electronic parts in an industrial scale.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.