Patent · US Active

Low stress pellicle frames and reticle pellicle assemblies

US7851109B2 · kind B2 · utility

2Cited by

3References

20Claims

0Family size

Assignee

Intel Corporation · US

Inventors

Kishore K. Chakravorty · San Jose, US
Frank E. Abboud · Hayward, US
Henry Yun · San Jose, US

Key dates

Filing date	Mar 31, 2008
Grant date	Dec 14, 2010
Priority date	—
Expiry date	Jan 30, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70983
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame induces in a reticle plate. In other embodiments, a pellicle frame of reduced adhesive surface is employed to reduce the stress a pellicle frame induces in a reticle plate. In accordance with still other embodiments, a stress compensating frame is employed to reduce the cumulative stresses in an assembly comprising the reticle plate, pellicle and stress compensating frame.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.