Flat panel display manufacturing
US7851141B2 · kind B2 · utility
1Cited by
1References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 2, 2007 |
| Grant date | Dec 14, 2010 |
| Priority date | — |
| Expiry date | Apr 12, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7084
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method includes exposing a photo-resist layer using a first exposure machine that has a first resolution to cause the photo-resist layer to have an exposed portion and an un-exposed portion. The photo-resist layer is exposed using a second exposure machine that has a second resolution to further expose the un-exposed portion of the photo-resist layer, the first resolution being different from the second resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.