Polymer wavelength filters with high-resolution periodical structures and its fabrication using replication process
US7853102B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 2007 |
| Grant date | Dec 14, 2010 |
| Priority date | — |
| Expiry date | Nov 6, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/138
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention discloses a method for fabricating polymer wavelength filter with high-resolution periodical structure, which comprises: a positive photo-resister film is coated or a substrate, holographically exposed with grating pattern, and coated with a negative photo-resister film, then exposed by UV light and developed to obtain a waveguide mold having negative waveguide; a PDMS film coated on the waveguide mold, baked and peeled off to obtain a PDMS mold; a first tunnel formed over the PDMS mold, injected with a first UV polymer, then cured and separated the first UV polymer having groove to be the cladding layer of the polymer wavelength filter; a second UV polymer injected into the groove of the cladding layer, and cured to form the core of the waveguide in the groove of the cladding layer to finally be the polymer wavelength filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.