Patent · US Active

Method of manufacturing a piezoelectric thin film device

US7854049B2 · kind B2 · utility

8Cited by
5References
6Claims
0Family size

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Key dates

Filing dateFeb 16, 2007
Grant dateDec 21, 2010
Priority date
Expiry dateJun 26, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49005
  • WIPO fieldBasic communication processes
  • WIPO sectorElectrical engineering

Abstract

In a piezoelectric thin film device of the present invention, the degree of flexibility is enhanced in selection of a piezoelectric material constituting a piezoelectric thin film and the crystal orientation in the piezoelectric thin film. A piezoelectric thin film filter, including four film bulk acoustic resonators, has a configuration where a filter section for providing a filter function of the piezoelectric thin film filter is bonded with a flat base substrate mechanically supporting the filter section via an adhesive layer. In manufacturing of the piezoelectric thin film filter, a piezoelectric thin film is obtained by performing removal processing on a piezoelectric substrate, but the piezoelectric thin film obtained by removal processing cannot independently stand up under its own weight. For this reason, a prescribed member including the piezoelectric substrate is previously bonded to the base substrate as a support prior to the removal processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.