Analysis of patterns among objects of a plurality of classes
US7856136B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2004 |
| Grant date | Dec 21, 2010 |
| Priority date | — |
| Expiry date | Apr 9, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30004
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for the detection and analysis of patterns receives an image containing object labels and performs relational feature development using the input image to create at least one pattern map. It then performs relational feature analysis using the at least one pattern map to create a relational feature analysis result. The pattern detection and analysis method further comprises a recipe for automation control and includes determination of a genetic anomaly.A relational feature development method receives an image containing object labels and performs core measurement table development using the input image to create at least one core measurement table. It then performs feature table production using the at least one core measurement table to create at least one feature table. It also performs PatternMap creation using the at least one feature table to create a PatternMap. The relational feature development method further comprises a PatternMap integration and update step to create an updated PatternMap.A boundary distance measurement receives an image containing object labels and performs structure object mask production using the input image to create structure object mask. It…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.