Method for manufacturing poorly conductive layers
US7857948B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 19, 2006 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Mar 29, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Method for producing poorly conductive and in particular nonconductive layers on at least one work piece by means of a vacuum-coating process in which an electric arc discharge is activated between at least one anode and the cathode of an arc source in a reactive-gas atmosphere, whereby on the surface of a target that is electrically connected to the cathode either none or only a small outer magnetic field is generated that extends essentially perpendicular to the target surface for assisting the evaporation process, the degree of recoating of the target surface by other coating sources is less than 10%, and the magnetic field is generated with a magnet system that encompasses at least one axially polarized coil with a geometry similar to the circumference of the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.