Methods of fabricating nanowires and electrodes having nanogaps
US7857959B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2007 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Oct 27, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R33/1269
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A cost-effective and highly reproducible method of fabricating nanowires, and small gaps or spacings in nanowires is disclosed. The nanogaps bridge an important size regime between 1 nm and 100 nm. The nanogaps can be selectively predetermined to be as small as 1.0 nm, or larger than 1000 nm. These electrode gaps can be useful in preparing molecular electronic devices that involve making electrical contact to individual molecules, such as biomolecules, or small clusters of molecules. Microelectrodes having nanogaps for electrical and magnetic applications formed by the method, and as well as biosensors and their use in detecting a biological species, such as DNA, are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.